This batch of Japanese-sourced high-purity Sapphire Crystal Wafers features excellent flatness and surface roughness for the most demanding of applications (such as Electron-Beam Lithography and Cr Deposition).
P/N: SPS-R-0070-0050F-C
| Substrate Material: | Sapphire Crystal. C-cut/C-plane |
| Outer Diameter: | Dia 7.0,-0.1/+0mm |
| Thickness: | 0.500,+/-0.015mm |
| Surface Quality: | 10-5 S/D, double-side polished(DSP) |
| Flatness: | < Lambda/10 @ 633nm over DIA7.0mm surface specially processed |
| Parallelism: | <30 arc seconds |
| Roughness: | Ra<10A RMS |
| Orientation: | C-plane surface |
| Chamfer: | Unbevelled; Edge surface ground |
| MOQ: | MOQ 50pcs(minimum order quantity) ; Packing 1010T1 P-box/vacuum packed |
